-----BEGIN PRIVACY-ENHANCED MESSAGE----- Proc-Type: 2001,MIC-CLEAR Originator-Name: webmaster@www.sec.gov Originator-Key-Asymmetric: MFgwCgYEVQgBAQICAf8DSgAwRwJAW2sNKK9AVtBzYZmr6aGjlWyK3XmZv3dTINen TWSM7vrzLADbmYQaionwg5sDW3P6oaM5D3tdezXMm7z1T+B+twIDAQAB MIC-Info: RSA-MD5,RSA, S8JXVEDjPBNhQlP2edNE965RlPLmyavo+Zxu700crDwrtEfVTlTLfNxun8ATCscx 7Alzx/uRPA0l77cdnzB9Ww== 0000950123-09-067421.txt : 20091202 0000950123-09-067421.hdr.sgml : 20091202 20091202061230 ACCESSION NUMBER: 0000950123-09-067421 CONFORMED SUBMISSION TYPE: 6-K PUBLIC DOCUMENT COUNT: 3 CONFORMED PERIOD OF REPORT: 20091202 FILED AS OF DATE: 20091202 DATE AS OF CHANGE: 20091202 FILER: COMPANY DATA: COMPANY CONFORMED NAME: ASML HOLDING NV CENTRAL INDEX KEY: 0000937966 STANDARD INDUSTRIAL CLASSIFICATION: SPECIAL INDUSTRY MACHINERY, NEC [3559] IRS NUMBER: 000000000 FISCAL YEAR END: 1231 FILING VALUES: FORM TYPE: 6-K SEC ACT: 1934 Act SEC FILE NUMBER: 001-33463 FILM NUMBER: 091216065 BUSINESS ADDRESS: STREET 1: DE RUN 6501 CITY: DR VELDHOVEN STATE: P7 ZIP: 5504 BUSINESS PHONE: 31402683000 MAIL ADDRESS: STREET 1: P.O. BOX 324 CITY: AH VELDHOVEN STATE: P7 ZIP: 5500 FORMER COMPANY: FORMER CONFORMED NAME: ASM LITHOGRAPHY HOLDING NV DATE OF NAME CHANGE: 19950215 6-K 1 u08013e6vk.htm FORM 6-K e6vk
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SECURITIES AND EXCHANGE COMMISSION
Washington, D.C. 20549
 
FORM 6-K
REPORT OF A FOREIGN ISSUER
PURSUANT TO RULE 13A-16 OR 15D-16
OF THE SECURITIES EXCHANGE ACT OF 1934
For December 2, 2009
 
ASML Holding N.V.
De Run 6501
5504 DR Veldhoven
The Netherlands
(Address of principal executive offices)
 
Indicate by check mark whether the registrant files or will file annual reports under cover of Form 20-F or Form 40-F.
Form 20-F  þ            Form 40-F  o
Indicate by check mark whether the registrant by furnishing the information contained in this Form
is also thereby furnishing the information to the Commission pursuant to Rule 12g3-2(b) under the
Securities Exchange Act of 1934.
Yes  o            No  þ
If “Yes” is marked, indicate below the file number assigned to the registrant in connection with
Rule 12g3-2(b):
 
 

 


TABLE OF CONTENTS

Exhibits
SIGNATURES
Exhibit 99.1


Table of Contents

(ASML LOGO)
Exhibits
99.1   “Chartered Adopts Brion’s Computational Lithography Solutions,” press release dated November 2, 2009
     “Safe Harbor” Statement under the US Private Securities Litigation Reform Act of 1995: the matters discussed in this document may include forward-looking statements, including statements made about our outlook, realization of backlog, IC unit demand, financial results, average sales price, gross margin and expenses. These forward looking statements are subject to risks and uncertainties including, but not limited to: economic conditions, product demand and semiconductor equipment industry capacity, worldwide demand and manufacturing capacity utilization for semiconductors (the principal product of our customer base), including the impact of credit market deterioration on consumer confidence and demand for our customers’ products, competitive products and pricing, manufacturing efficiencies, new product development and customer acceptance of new products, ability to enforce patents and protect intellectual property rights, the outcome of intellectual property litigation, availability of raw materials and critical manufacturing equipment, trade environment, changes in exchange rates and other risks indicated in the risk factors included in ASML’s Annual Report on Form 20-F and other filings with the US Securities and Exchange Commission.

2


Table of Contents

SIGNATURES
     Pursuant to the requirements of the Securities Exchange Act of 1934, the registrant has duly caused this report to be signed on its behalf by the undersigned, thereunto duly authorized.
         
  ASML HOLDING N.V. (Registrant)
 
 
Date: December 2, 2009  By:   /s/ Peter T.F.M. Wennink    
    Peter T.F.M. Wennink   
    Executive Vice President
and Chief Financial Officer 
 
 

3

EX-99.1 2 u08013exv99w1.htm EXHIBIT 99.1 exv99w1
Exhibit 99.1
Media Relations Contacts
Lucas van Grinsven — Corporate Communications — +31 40 268 3949 — Veldhoven, the Netherlands
Ryan Young — Communication US — +1 480 383 4733 — Tempe, Arizona, USA
Investor Relations Contacts
Craig DeYoung — Investor Relations — +1 480 383 4005 — Tempe, Arizona, USA
Franki D’Hoore — Investor Relations — +31 40 268 6494 — Veldhoven, the Netherlands
Chartered Adopts Brion’s Computational Lithography Solutions
SANTA CLARA, Calif., November 2, 2009 — Brion Technologies, an ASML company, has reached a multi-year agreement with Chartered Semiconductor Manufacturing Ltd., one of the world’s top dedicated semiconductor foundries, to implement a broad suite of computational lithography products. Chartered will use TachyonTM OPC+ (optical proximity correction), Tachyon LMC (lithography manufacturability check), and Tachyon resolution enhancement products to design and manufacture 45-nanometer (nm) and below technology node devices.
Brion’s Tachyon products will help Chartered optimize its ASML scanners to provide a comprehensive lithography solution with optimal cost of ownership. Brion will work with Chartered to implement Tachyon computational products to deliver larger manufacturing process windows resulting in improved line width control for higher yield.
Meeting the imaging requirements of advanced technology nodes will require the effective use of increasingly complex Resolution Enhancement Techniques (RET). Chartered will have access to Brion’s double-patterning solutions such as Tachyon DPT litho double patterning and several RET and computational lithography solutions. Brion’s double patterning options allow Chartered to select the optimum combination of techniques for each design and every layer, which help to minimize lithography costs.
“Chartered is committed to providing its customers with robust and cost-effective manufacturing solutions. ASML’s and Brion’s integrated suite of lithography products for process development, mask design and litho manufacturing enables Chartered to offer advanced technology solutions that are optimized for higher yields,” said Liang Choo Hsia, senior vice president of technology development at Chartered.
“Brion is excited to work with Chartered and help it address the increasing challenges of advanced semiconductor manufacturing,” said Jim Koonmen, general manager of Brion.

 


 

“We offer the broadest and most powerful range of computational lithography products and look forward to a long and mutually beneficial relationship with Chartered.”
About Computational Lithography
Computational lithography is the use of computer modeling to predict, correct, optimize and verify imaging performance of the lithography process over a range of patterns, processes, and system conditions. For an overview of computational lithography products, a video entitled “Virtual Scanning for Smarter Chips” is available on www.asml.com. Additional information on computational lithography can also be found on asml.com and brion.com.
About Brion Technologies
Brion Technologies is a division of ASML and an industry leader in computational lithography for integrated circuits. Brion’s TachyonTM platform, a source mask optimization, OPC and OPC verification system, enables capabilities that address chip design, photomask making and wafer printing for semiconductor manufacturing. Brion is headquartered in Santa Clara, California. For more information: www.brion.com
About ASML
ASML is the world’s leading provider of lithography systems for the semiconductor industry, manufacturing complex machines that are critical to the production of integrated circuits or chips. Headquartered in Veldhoven, the Netherlands, ASML is traded on Euronext Amsterdam and NASDAQ under the symbol ASML. ASML provides systems and service to chip manufacturers in more than 60 locations in 15 countries.

 

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